Ion Beam Sputtering Series

Our Ion Beam Sputtering System is ideal for producing dense, low-loss coatings such as AR, HR, laser facet coatings, ITO, and multilayer. Equipped with a gridded primary ion source, fully automated control panels the system delivers exceptional film uniformity, adhesion, and repeatability for research, prototyping, and small-volume production environments.

Dual ion beam configuration with primary gridded sputter source and assist/neutralizer source

High-vacuum architecture with turbo and cryo pump options for ≤1×10⁻⁷ mbar base pressure

4-target water-cooled carousel with auto-indexing for multilayer stacks

Substrate stage with rotation, tilt, and optional heating up to 250°C (higher-temperature options available)

Excellent thickness uniformity (typically ±2% over a 4-inch substrate)

Compact, robust chamber design with typical 500 × 500 × 500 mm process volume

Ion Beam Sputtering Series

OptiBeam DIBS is a high-precision dual ion beam sputtering system designed for advanced optical and dielectric thin-film deposition

Features