Substrate Rotation, Heating, Cooling, RF and DC Biasing

Substrate Rotation, Heating, Cooling, RF and DC Biasing

A range of work holders covers rotation through heating, biasing, tilting and options for z-shifting for use with HHV’s load lock and transfer systems. Transferable substrate carriers are available which allow the heaters to accommodate either full size substrates or a number of small samples.

RF or DC biasing is optional for fixed and rotating models and permits both substrate pre-cleaning and simultaneous, low energy ion bombardment during deposition to enhance adhesion, film density and film properties. Reactive gas injection rings and manual or motorized positioning are also available on selected models.

Substrate heating is available with options offering to 1000oC. Substrate coolers with the ability to keep substrates between 80 K or  80o C using LN2, water or cool air are also available.

Auto306 is available with quartz lamp heating and water cooling, while models from Auto500 upwards have options for higher temperature heating plus biasing and more extensive cooling options.