BT150 and BT300 Bench Top Coaters

BT150 and BT300 Bench Top Coaters

New bench-top deposition tools for SEM and TEM sample prep, plus R&D applications

The new HHV BT150 and BT300 are compact and economical bench top coating systems designed to suit the needs of electron microscopists and researchers.

Both systems are designed for ease of use and feature a full-colour, menu-driven, touch-screen control system for fully-automatic control. The control system can store up to 30 different process recipes for easy recall and can output process data to a separate device for storage.

In addition to EM applications, BT-series can also be configured for metals sputtering and metals evaporation for researchers.

BT-series systems can sputter non-noble metals such as aluminium where the turbo pump option is fitted.




BT150 for SEM and TEM sample prep

BT150 has a 165mm diameter x 150mm tall borosilicate glass chamber and is configured for SEM and TEM sample preparation. Options include:-

• Dual DC sputter sources for sequential metal sputter deposition on samples up to 150mm diameter
• Triple DC sputter sources for metal deposition on samples up to 200mm diameter
• 100mm and 150mm diameter rotary substrate stages, 200mm diameter planetary stage
• Choice of rotary pump, dry scroll pump and turbo pumping systems
• Extended chamber height options

All BT300 systems are fitted with a standard integrated source shutter.

Wide range of sample stages

BT-series features a wide range of sample stages. The static stage for SEM stubs features water cooling to provide protection against specimen heating, and includes a sputter etching and cleaning facility. Use of the etching facility can improve the image contrast of some specimens, and non-delicate specimens can be cleaned by removal of adsorbed water to improve film adhesion.

BT150 stage options include rotary and planetary designs for SEM stubs and rotary options for substrates up to 4” / 100mm. In addition to these the BT300 also features rotary and planetary stages for substrates up to 8” / 200mm diameter for research applications.

Glow discharge cleaning

BT-series has the option of a glow-discharge system for TEM work. Glow discharge process converts the surface of a carbon support film from hydrophobic to hydrophilic properties.

Integrated film thickness monitoring

BT-series includes the option of a fully-integrated film thickness monitor system. The system is integrated into the touch-screen controller and provides control of the thickness of sputtered films.

Easy target change

BT150 and BT300 use easy-to-change targets to allow specimens to be coated with different materials where required. Systems with rotary pump can sputter noble metals including Au, Au/Pd, Pt and Cu. Adding the optional turbo pump allows both systems to sputter oxidising metals such as Al for research applications.

Vacuum pumping options

The systems can be specified with a two-stage rotary pump for ‘everyday’ operation with carbon and noble metals. The turbo pump option provides additional vacuum performance those users requiring true high vacuum conditions. Sputter systems can sputter non-noble metals such as Al where the turbo pump option is specified.

BT-series can be specified with a dry-running scroll pump where oil-free vacuum is required.

Comprehensive safety and certification

BT150 and BT300 are provided with comprehensive safety systems and interlocks to provide protection for the user.

BT150 and BT300 are CE marked. UL-certification can be provided.



Ease of operation
Full colour, high resolution, touch screen control system
Recipe storage and editing for up to 30 processes
Process data output to mass storage device or PC
Optional integrated film thickness monitoring system

Complete range of deposition techniques

Carbon fibre and carbon rod techniques for TEM
Glow discharge accessory for hydrophilic surface modification of carbon films for TEM
Noble metals sputtering techniques for SEMS
putter deposition of metals such as aluminium for R&D (requires turbo pump option)
Resistance source option for metals deposition for EM and R&D
Automatic shutter options

A comprehensive range of sample stages
Water cooled SEM stage with bias operation
Rotary SEM stage
Planetary SEM stage
Rotary stage for R&D (BT150)
Rotary and planetary stages for R&D up to 8” / 200mm diameter (BT300)

BT150
Chamber:                                                                Glass cylinder 165mm diameter x 150mm tall with implosion guard.
Option for 200mm tall chamberRotary pump: 12m3 two-stage rotary pump.
Turbo pump option:                                                62l/s compound turbomolecular pump with on-board controller
Ultimate vacuum (rotary pump only):                 5x10-2mbar in <3 minutes
Ultimate vacuum (with turbo pump):                  5x10-6mbar in <8 minutes
Power input:                                                             100-230V, 50/60Hz, single phase

Process accessories
Metals sputtering:                             Single magnetron source for 54mm diameter target
Available targets:                                Au, Au/Pd, Cu, Fe
Sputter options:                                  Sputters oxidising metals (Aluminium) where turbo pump option specified
Carbon fibre evaporation:                 Pulse deposition with selectable current and degas mode
Carbon rod evaporation:                   Pulse deposition with selectable current and degas mode
Water cooled SEM stage:                   Water cooled with bias function for 6 stubs
Rotary and planetary SEM stages:   Rotary stage for 6 stubs, planetary stage for 6 stubs
Rotary stage for R&D:                         Rotary stage for substrates up to 100mm diameter

BT300
Chamber:                                              Glass cylinder 300mm diameter x 150mm tall with implosion guard.
                                                              Option for 200mm tall chamberRotary pump: 12m 3 two-stage rotary pump.
Turbo pump option:                                62l/s compound turbomolecular pump with on-board controller
Ultimate vacuum (rotary pump only): 5x10-2mbar
Ultimate vacuum (with turbo pump): 5x10-5mbar
Power input:                                            110-230v, 60-50hz, single phase

Process accessories
Metals sputtering:            Single, or dual, or triple magnetron source for 54mm diameter targets
Available targets:              Au, Au/Pd, Cu, Fe
Sputter options:                Sputters oxidising metals (Aluminium) where turbo pump option specified
Rotary stage for R & D:  Rotary stage for substrates up to 100mm diameter (dual target),
                                                150mm (triple target)
Planetary stage for R & D:Planetary stage for uniformity on substrates up to 200mm diameter (triple target)